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Media Lario's EUV lithography collector
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- Title Media Lario's EUV lithography collector
- Released 19/03/2010 11:33 am
- Copyright Media Lario Technologies
Media Lario’s extreme ultraviolet (EUV) collector mirrors for semiconductor lithography are based on the original investment in the technologies and competences needed to produce the optical mirrors for ESA’s XMM-Newton spacecraft. The EUV collector will be used in the production of the next-generation of faster and smaller integrated semiconductor circuits.